How EBL Enables High Quality Nanopatterning and Nanolithography

Discover cutting-edge solutions for e-beam lithography and nanofabrication from ZEISS and RAITH

Nanofabrication plays a crucial role in applications such as quantum technology device engineering, electrical engineering, nanocontacting, photonics, optoelectronics, and microfluidics. The research challenges in nanolithography and nanofabrication lies in the ability to create highly resolved nanometer scale features while ensuring accuracy, stability and repeatability. 

Researchers in nanofabrication will utilize advanced imaging and lithography with an electron beam lithography system specially tailored for nanoengineering. These systems, which integrate the ZEISS Gemini electron optical column with RAITH ELPHY pattern generators, enable the creation of nanometer-scale objects and deliver high-resolution imaging, even at low kV. Additionally, the combination of the systems offers exceptional flexibility, supporting a range of accessories for in-depth structural analysis with various techniques.

Join us for this webinar to learn how the ZEISS/RAITH EBL solution with its remarkable reliability driven by unique features such as the Gemini electron optics, the FIB column ZEISS Ion-sculptor, and the RAITH ELPHY attachment, enable the precise design of new materials and devices needed to support the latest advancement needs in nanofabrication, nanostructure, and nanoobject imaging and analysis.

Key Learnings for Attendees: 

• How Electron beam lithography (EBL)  is used to design devices, systems and functional materials at the nanometer scale
• How you can achieve a proven reliability in nanolithography based on unique properties of the ZEISS FE-SEM GEMINI column, Ion-Sculptor FIB column and ZEISS-RAITH interface
• How RAITH ELPHY upgrade kits aka “lithography attachments” add value to the ZEISS GEMINI-based FE-SEM and/or Crossbeam systems to extend the applications to nanolithography and nanofabrication without compromising any of their original functionality e.g., imaging, analysis, or micromanipulation
• Application examples in the field of quantum engineering, electrical engineering, photonics, optoelectronics & microfluidic will be provided using the ZEISS/RAITH EBL solution