Atomic Insights: Navigating the Future of Semiconductor Quality eSymposium Series

As semiconductor devices shrink and performance demands intensify, controlling ultratrace element impurities and advancing analytical workflows is more critical than ever. This two-day symposium brings together industry experts to share the latest innovations in contamination control, ICP-MS elemental analysis, and automation.

The two-day program covers Vapor Phase Decomposition (VPD) coupled with ICP-MS as a cornerstone of wafer surface monitoring, single nanoparticle (sNP) analysis using spICP-MS mode for detecting contaminants in process chemicals, and the expanding role of automation in boosting throughput and reproducibility. Sessions will also explore the industry’s shift from ppt to ppq-level detection, strategies for precision using MassHunter software, and insights from thermodynamic analysis to support smarter process optimization.

Who should attend:

• Semiconductor Process Engineer – focused on contamination control and yield improvement.
• Analytical Chemist – working with trace element detection and spICP-MS workflows.
• R&D Scientist – developing new materials or processes for semiconductor applications.
• QA/QC Specialist – responsible for ensuring purity and compliance in production.
• Lab Manager or Technical Lead – overseeing analytical instrumentation and workflow automation.

East Schedule: 11:30am IST | 2:00pm SGT | 3:00pm JST 

West Schedule: 8:00am PST | 11:00am EDT | 7:00pm GST 

Session 1 will dive into the latest advances in ultratrace elements analysis for semiconductor manufacturing. From wafer surfaces to complex process chemicals, you’ll discover how cutting-edge ICP-MS workflows and software innovations are helping fabs push detection limits to the ppq level. Join to explore new strategies that strengthen contamination control, improve reproducibility, and drive higher device performance.

Key learnings for attendees:

• Discover how Vapor Phase Decomposition (VPD) coupled with ICP-MS enables atomic-level contamination control on wafer surfaces.
• Learn how ICP-MS software tools streamline ultratrace elemental analysis for precision and reproducibility.
• Understand the industry’s drive from ppt to ppq-level impurity detection to safeguard yield.

Who should attend:

• Semiconductor Process Engineers – focused on wafer contamination control and yield improvement.
• Analytical Chemists – working with ICP-MS methods for trace element detection.
• QA/QC Specialists – ensuring purity and compliance in semiconductor processes.

East Schedule: 11:30am IST | 2:00pm SGT | 3:00pm JST 

West Schedule: 8:00am PST | 11:00am EDT | 7:00pm GST 

Session 2 will explore how innovation is reshaping semiconductor analysis and production. Expect forward-looking sessions on single nanoparticle (sNP) detection using spICP-MS mode, expanding automation in trace-elements workflows, and the role of thermodynamic modelling in optimizing processes. Attendees will also gain practical insights into ensuring supply reliability—all designed to help you prepare for the next generation of semiconductor purity and performance.

Key learnings for attendees:

• Explore how spICP-MS mode identifies nanoparticles and emerging contamination risks in process chemicals.
• See how automation is transforming trace element analysis with higher throughput and consistency.
• Gain insights into thermodynamic modelling for smarter material behaviour analysis and process optimization.

Who should attend:

• R&D Scientists – developing new materials and processes for next-generation semiconductors.
• Lab Managers and Technical Leads – overseeing instrumentation and workflow automation.
• Engineers focused on innovation – driving long-term reliability and process improvements.